Formation of Ordered Nanoscale Semiconductor Dots by Ion Sputtering.

Facsko, S; Dekorsy, T; Koerdt, C; Trappe, C; Kurz, H; Vogt, A; Hartnagel, HL · Science · 1999

basic_science · Level V

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Abstract

A formation process for semiconductor quantum dots based on a surface instability induced by ion sputtering under normal incidence is presented. Crystalline dots 35 nanometers in diameter and arranged in a regular hexagonal lattice were produced on gallium antimonide surfaces. The formation mechanism relies on a natural self-organization mechanism that occurs during the erosion of surfaces, which is based on the interplay between roughening induced by ion sputtering and smoothing due to surface diffusion.