Generating an etch resistant "resist" layer from common solvents using scanning probe lithography in a fluid cell.
basic_science · Level V
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Abstract
A novel scanning probe lithography scheme is introduced involving the field-induced deposition of etch resistant material generated from common organic solvents such as n-octane, toluene, ethyl alcohol, and dioxane in the tip/sample gap region of a liquid cell. An NH(4)F/H(2)O(2)/H(2)O etchant transfers these structures into 7 nm tall posts in a negative-tone fashion, indicating that an etch resistant, likely carbon-based material is produced by field-induced decomposition of the solvent. This is in sharp contrast to the positive tone images that result from a similar process involving water as the gap electrolyte followed by a similar fluorine-based etching.
Medical subject headings
- Electrochemistry
- Membranes, Artificial
- Micromanipulation
- Microscopy, Atomic Force
- Nanostructures
- Solvents