Additive soft-lithographic patterning of submicrometer- and nanometer-scale large-area resists on electronic materials.
basic_science · Level V
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Abstract
We describe a novel soft-lithographic technique possessing broad utility for the fabrication of large area, nanoscale ( approximately 100 nm) multilayer resist structures on electronic material substrates. This additive patterning method transfers ultrathin poly(dimethylsiloxane) (PDMS) decals to an underlying SiO(2)-capped organic planarazation layer. The PDMS patterns serve as a latent image through which high-quality multilayer resist structures can be developed using reactive ion-beam etching.
Medical subject headings
- Crystallization
- Dimethylpolysiloxanes
- Electronics
- Nanostructures
- Photography
- Silicon Dioxide
- Silicones