Nanoimprint lithography for nanophotonics in silicon.
basic_science · Level V
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- Record sourced from PubMed, PMID 18698727.
- Also identified by DOI 10.1021/nl801615c.
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Abstract
A novel inverse imprinting procedure for nanolithography is presented which offers a transfer accuracy and feature definition that is comparable to state-of-the-art nanofabrication techniques. We illustrate the fabrication quality of a demanding nanophotonic structure: a photonic crystal waveguide. Local examination using photon scanning tunneling microscopy (PSTM) shows that the resulting nanophotonic structures have excellent guiding properties at wavelengths in the telecommunications range, which indicates a high quality of the local structure and the overall periodicity.