Structure of the buried metal-molecule interface in organic thin film devices.
basic_science · Level V
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- Record sourced from PubMed, PMID 19199753.
- Also identified by DOI 10.1021/nl803393m.
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Abstract
By use of specular X-ray reflectivity (XR) the structure of a metal-covered organic thin film device is measured with angstrom resolution. The model system is a Langmuir-Blodgett (LB) film, sandwiched between a silicon substrate and a top electrode consisting of 25 A titanium and 100 A aluminum. By comparison of XR data for the five-layer Pb2+ arachidate LB film before and after vapor deposition of the Ti/Al top electrode, a detailed account of the structural damage to the organic film at the buried metal-molecule interface is obtained. We find that the organized structure of the two topmost LB layers (approximately 5 nm) is completely destroyed due to the metal deposition.
Medical subject headings
- Nanotechnology