One-step photoembossing for submicrometer surface relief structures in liquid crystal semiconductors.
basic_science · Level V
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- Record sourced from PubMed, PMID 20455584.
- Also identified by DOI 10.1021/nn100012g.
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Abstract
We report a new single-step method to directly imprint nanometer-scale structures on photoreactive organic semiconductors. A surface relief grating is spontaneously formed when a light-emitting, liquid crystalline, and semiconducting thin film is irradiated by patterned light generated using a phase mask. Grating formation requires no postannealing nor wet etching so there is potential for high-throughput fabrication. The structured film is cross-linked for robustness. Gratings deeper than the original film thickness are made with periods as small as 265 nm. Grating formation is attributed to mass transfer, enhanced by self-assembly, from dark to illuminated regions. A photovoltaic device incorporating the grating is discussed.
Medical subject headings
- Crystallization
- Liquid Crystals
- Nanostructures
- Nanotechnology
- Photography
- Semiconductors