Direct writing of sub-5 nm hafnium diboride metallic nanostructures.
basic_science · Level V
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- Record sourced from PubMed, PMID 20964393.
- Also identified by DOI 10.1021/nn1018522.
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Abstract
Sub-5 nm metallic hafnium diboride (HfB(2)) nanostructures were directly written onto Si(100)-2 × 1:H surfaces using ultrahigh vacuum scanning tunneling microscope (UHV-STM) electron beam induced deposition (EBID) of a carbon-free precursor molecule, tetrakis(tetrahydroborato)hafnium, Hf(BH(4))(4). Scanning tunneling spectroscopy data confirm the metallic nature of the HfB(2) nanostructures, which have been written down to lateral dimensions of ∼2.5 nm. To our knowledge, this is the first demonstration of sub-5 nm metallic nanostructures in an STM-EBID experiment.