Block copolymer nanolithography: translation of molecular level control to nanoscale patterns.
review · Level V
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- Record sourced from PubMed, PMID 21049495.
- Also identified by DOI 10.1002/adma.200803302.
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Abstract
The self-asembly of block copolymers is a promising platform for the "bottom-up" fabrication of nanostructured materials and devices. This review covers some of the advances made in this field from the laboratory setting to applications where block copolymers are in use.