Hierarchical nanostructures by sequential self-assembly of styrene-dimethylsiloxane block copolymers of different periods.
basic_science · Level V
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- Record sourced from PubMed, PMID 21274911.
- Also identified by DOI 10.1002/adma.201002999.
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Abstract
Poly(styrene-block-dimethylsiloxane) (PS-b-PDMS) block copolymers with a period as low as 13 nm have been self-assembled on a template formed from PS-b-PDMS of a 34–40 nm period, which is itself templated by micron-scale substrate features prepared using conventional lithography. This hierarchical process provides a simple method for directing the self-assembly of sub-10 nm features and registering them on the substrate.
Medical subject headings
- Dimethylpolysiloxanes
- Nanostructures
- Nanotechnology
- Polymerization
- Polystyrenes