Directed 2D-to-3D pattern transfer method for controlled fabrication of topologically complex 3D features in silicon.
basic_science · Level V
Where this comes from
- Record sourced from PubMed, PMID 21274916.
- Also identified by DOI 10.1002/adma.201003833.
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Abstract
A process that allows control over the 3D motion of catalyst nanostructures during metal-assisted chemical etching by their local pinning prior to etching is demonstrated. The pinning material acts as a fulcrum for rotation of the catalyst structures resulting in etching of silicon features with rotational geometry.
Medical subject headings
- Microtechnology
- Molecular Conformation
- Nanotechnology
- Silicon