Gradient solvent vapor annealing of block copolymer thin films using a microfluidic mixing device.
basic_science · Level V
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- Record sourced from PubMed, PMID 21306128.
- Also identified by DOI 10.1021/nl104496r.
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Abstract
Solvent vapor annealing (SVA) with solvent mixtures is a promising approach for controlling block copolymer thin film self-assembly. In this work, we present the design and fabrication of a solvent-resistant microfluidic mixing device to produce discrete SVA gradients in solvent composition and/or total solvent concentration. Using this device, we identified solvent composition dependent morphology transformations in poly(styrene-b-isoprene-b-styrene) films. This device enables faster and more robust exploration of SVA parameter space, providing insight into self-assembly phenomena.