Joule-assisted silicidation for short-channel silicon nanowire devices.
basic_science · Level V
Where this comes from
- Record sourced from PubMed, PMID 21815658.
- Also identified by DOI 10.1021/nn202524j.
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Abstract
We report on a technique enabling electrical control of the contact silicidation process in silicon nanowire devices. Undoped silicon nanowires were contacted by pairs of nickel electrodes, and each contact was selectively silicided by means of the Joule effect. By a real-time monitoring of the nanowire electrical resistance during the contact silicidation process we were able to fabricate nickel-silicide/silicon/nickel-silicide devices with controlled silicon channel length down to 8 nm.