Binary Pt-Si nanostructures prepared by focused electron-beam-induced deposition.
basic_science · Level V
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- Record sourced from PubMed, PMID 22050515.
- Also identified by DOI 10.1021/nn203134a.
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Abstract
Binary systems of Pt-Si are prepared by electron-beam-induced deposition using the two precursors, trimethyl(methylcyclopentadienyl)platinum(IV) (MeCpPt(Me)(3)) and neopentasilane (Si(SiH(3))(4)), simultaneously. By varying the relative flux of the two precursors during deposition, we are able to study composites containing platinum and silicon in different ratios by means of energy-dispersive X-ray spectroscopy, atomic force microscopy, electrical transport measurements, and transmission electron microscopy. The results show strong evidence for the formation of a binary, metastable Pt(2)Si(3) phase, leading to a maximum in the conductivity for a Si/Pt ratio of 3:2.
Medical subject headings
- Electroplating
- Nanostructures
- Platinum
- Silicon