Fabrication of silicon oxide nanodots with an areal density beyond 1 teradots inch(-2).
basic_science · Level V
Where this comes from
- Record sourced from PubMed, PMID 22116790.
- Also identified by DOI 10.1002/adma.201102964.
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Abstract
The combination of solvent annealing, surface reconstruction, and a tone-reversal etching procedure provides an attractive approach to utilize block copolymer (BCP) lithography to fabricate highly ordered and densely packed silicon oxide nano-dots on a surface. The obtained silicon oxide nano-dots feature an areal density of 1.3 teradots inch(-2) .
Medical subject headings
- Nanoparticles
- Nanotechnology
- Polymers
- Silicon Dioxide