Ultrafast polymerization inhibition by stimulated emission depletion for three-dimensional nanolithography.
basic_science · Level V
Where this comes from
- Record sourced from PubMed, PMID 22323275.
- Also identified by DOI 10.1002/adma.201103758.
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Abstract
To identify the depletion mechanism in the stimulated-emission-depletion (STED) inspired photoresist composed of a ketocoumarin photoinitiator in pentaerythritol tetraacrylate, we perform lithography with pulsed excitation and tunable delayed depletion. A fast component can unambiguously be assigned to stimulated emission. Our results allow the systematical optimization of the conditions in next-generation STED direct-laser-writing optical lithography.
Medical subject headings
- Nanotechnology
- Polymerization
- Printing