Tailoring nanostructures using copolymer nanoimprint lithography.

Thébault, Pascal; Niedermayer, Stefan; Landis, Stefan; Chaix, Nicolas; Guenoun, Patrick; Daillant, Jean; Man, Xingkun; Andelman, David et al. · Adv Mater · 2012

basic_science · Level V

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Abstract

The generation of defect-free polymer nanostructures by nanoimprinting methods is described. Long-range nanorheology and shorter-range surface energy effects can be efficiently combined to provide alignment of copolymer lamellae over several micrometers. As an example, a perpendicular organization with respect to circular tracks is shown, demonstrating the possibility of writing ordered radial nanostructures over large distances.

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