GaS and GaSe ultrathin layer transistors.

Late, Dattatray J; Liu, Bin; Luo, Jiajun; Yan, Aiming; Matte, H S S Ramakrishna; Grayson, Matthew; Rao, C N R; Dravid, Vinayak P · Adv Mater · 2012

basic_science · Level V

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Abstract

Room-temperature, bottom-gate, field-effect transistor characteristics of 2D ultrathin layer GaS and GaSe prepared from the bulk crystals using a micromechanical cleavage technique are reported. The transistors based on active GaS and GaSe ultrathin layers demonstrate typical n-and p-type conductance transistor operation along with a good ON/OFF ratio and electron differential mobility.

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