Dry lithography of large-area, thin-film organic semiconductors using frozen CO(2) resists.
basic_science · Level V
Where this comes from
- Record sourced from PubMed, PMID 22965485.
- Also identified by DOI 10.1002/adma.201202446 and PMC identifier 3546373.
- Licence recorded as CC BY.
- The licence permits redistribution, so the abstract is shown in full and the full text is available from the publisher.
Abstract
To address the incompatibility of organic semiconductors with traditional photolithography, an inert, frozen CO(2) resist is demonstrated that forms an in situ shadow mask. Contact with a room-temperature micro-featured stamp is used to pattern the resist. After thin film deposition, the remaining CO(2) is sublimed to lift off unwanted material. Pixel densities of 325 pixels-per-inch are shown.
Medical subject headings
- Carbon Dioxide
- Semiconductors