Atomic layer engineering of perovskite oxides for chemically sharp heterointerfaces.

Choi, Woo Seok; Rouleau, Christopher M; Seo, Sung Seok A; Luo, Zhenlin; Zhou, Hua; Fister, Timothy T; Eastman, Jeffrey A; Fuoss, Paul H et al. · Adv Mater · 2012

basic_science · Level V

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Abstract

Atomic layer engineering enables fabrication of a chemically sharp oxide heterointerface. The interface formation and strain evolution during the initial growth of LaAlO(3) /SrTiO(3) heterostructures by pulsed laser deposition are investigated in search of a means for controlling the atomic-sharpness of the interface. This study shows that inserting a monolayer of LaAlO(3) grown at high oxygen pressure dramatically enhances interface abruptness.

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