Super-resolution optical measurement of nanoscale photoacid distribution in lithographic materials.
basic_science · Level V
Where this comes from
- Record sourced from PubMed, PMID 23102414.
- Also identified by DOI 10.1021/nn304285m.
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Abstract
We demonstrate a method using photoactivation localization microscopy (PALM) in a soft-material system, with a rhodamine-lactam dye that is activated by both ultraviolet light and protonation, to reveal the nanoscale photoacid distribution in a model photoresist. Chemically amplified resists are the principal lithographic materials used in the semiconductor industry. The photoacid distribution generated upon exposure and its subsequent evolution during post-exposure bake is a major limiting factor in determining the resolution and lithographic quality of the final developed resist image. Our PALM data sets resolve the acid distribution in a latent image with subdiffraction limit accuracy. Our overall accuracy is currently limited by residual mechanical drift.
Medical subject headings
- Acids
- Image Enhancement
- Materials Testing
- Microscopy, Fluorescence
- Molecular Imaging
- Nanostructures
- Photography