Nanoscale block copolymer ordering induced by visible interferometric micropatterning: a route towards large scale block copolymer 2D crystals.

Aissou, Karim; Shaver, Jonah; Fleury, Guillaume; Pécastaings, Gilles; Brochon, Cyril; Navarro, Christophe; Grauby, Stéphane; Rampnoux, Jean-Michel et al. · Adv Mater · 2013

basic_science · Level V

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Abstract

We have overcome the cost and time consumption limitations of common lithography techniques used to control the self-assembly of block copolymers into highly ordered 2D arrays through the use of a guiding pattern created from a polymeric sub-layer. The guiding pattern is a sinusoidal surface-relief grating interferometrically inscribed onto an azobenzene containing copolymer sub-layer leading to a defect-free single grain of block copolymer domains.

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