Ultralow contact resistance at an epitaxial metal/oxide heterojunction through interstitial site doping.
basic_science · Level V
Where this comes from
- Record sourced from PubMed, PMID 23649872.
- Also identified by DOI 10.1002/adma.201301030.
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Abstract
Heteroepitaxial growth of Cr metal on Nb-doped SrTiO₃(001) is accompanied by Cr diffusion to interstitial sites within the first few atomic planes, an anchoring of the Cr film to the substrate, charge transfer from Cr to Ti, and metallization of the near-surface region, as depicted in the figure. The contact resistance of the resulting interface is exceedingly low.
Medical subject headings
- Metals
- Microelectrodes
- Oxides