Solvent-assisted directed self-assembly of spherical microdomain block copolymers to high areal density arrays.

Gu, Weiyin; Xu, Ji; Kim, Jung-Keun; Hong, Sung Woo; Wei, Xinyu; Yang, Xiaomin; Lee, Kim Y; Kuo, David S et al. · Adv Mater · 2013

basic_science · Level V

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Abstract

The fabrication process for 5 Tb/in(2) bit patterns using solvent-assisted directed self-assembly is investigated. The N-methyl-2-pyrrolidone solvent vapor-annealing method was used to achieve good long-range lateral ordering of low-molecular-weight polystyrene-block-polydimethylsiloxane with a lattice spacing of 11 nm on flat Si substrates, PS modified substrates and lithographically patterned substrates, respectively.

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