Sub-10 nm Graphene Nanoribbon Array field-effect transistors fabricated by block copolymer lithography.
basic_science · Level V
Where this comes from
- Record sourced from PubMed, PMID 23798365.
- Also identified by DOI 10.1002/adma.201300813.
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Abstract
Sub-10 nm Graphene Nanoribbon Arrays are fabricated over large areas by etching CVD-grown graphene. A mask is used made by the directed self-assembly of a cylindrical PS-b-PDMS block copolymer under solvent annealing guided by a removable template. The optimized solvent annealing process, surface-modified removable polymeric templates, and high Flory-Huggins interaction parameters of the block copolymer enable a highly aligned array of nanoribbons with low line edge roughness to be formed. This leads to a higher on/off ratio and stronger temperature dependence of the current for nanoribbon FETs, and a photocurrent which is 30 times larger compared to unpatterned graphene.
Medical subject headings
- Graphite
- Nanotubes, Carbon
- Transistors, Electronic