Non-porous low-k dielectric films based on a new structural amorphous fluoropolymer.
basic_science · Level V
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- Record sourced from PubMed, PMID 23857724.
- Also identified by DOI 10.1002/adma.201302021.
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Abstract
A non-porous and amorphous fluoropolymer PFN with low dielectric constant of 2.33 and dielectric loss less than 1.2 × 10(-3) is reported here. PFN also exhibits good mechanical properties and high thermostability. This study is a new example of a fully dense material showing a low k value and having good thermo/mechanical properties.