Long-range ordered self-assembly of novel acrylamide-based diblock copolymers for nanolithography and metallic nanostructure fabrication.
basic_science · Level V
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- Record sourced from PubMed, PMID 24504558.
- Also identified by DOI 10.1002/adma.201305186.
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Abstract
Novel acrylamide-based hard-soft hybrid block copolymers generate high-quality nanolithographic patterns satisfying high-resolution, long-range ordering, low defect density, moderate etch selectivity, and easy pattern transfer onto a substrate. The resulting patterns can also be used as a scaffold for metallic nanostructures such as aligned nanowires and nanomeshes with extraordinary structural regularity.