Fabrication of 200 nm period hard X-ray phase gratings.

Miao, Houxun; Gomella, Andrew A; Chedid, Nicholas; Chen, Lei; Wen, Han · Nano Lett · 2014

basic_science · Level V

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Abstract

Far field X-ray grating interferometry achieves extraordinary phase sensitivity in imaging weakly absorbing samples, provided that the grating period is within the transverse coherence length of the X-ray source. Here we describe a cost-efficient process to fabricate large area, 100 nm half-pitch hard X-ray phase gratings with an aspect ratio of 32. The nanometric gratings are suitable for ordinary compact X-ray sources having low spatial coherence, as demonstrated by X-ray diffraction experiments.

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