The Patterning of Sub-500 nm Inorganic Oxide Structures.
basic_science · Level V
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- Record sourced from PubMed, PMID 25213887.
- Also identified by DOI 10.1002/adma.200702495.
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Abstract
Elastomeric perfluoropolyether molds are applied to pattern arrays of sub-500 nm inorganic oxide features. This versatile soft-lithography technique can be used to pattern a wide range of materials; in this work inorganic oxides including TiO2 , SnO2 , ZnO, ITO, and BaTiO3 are patterned on a variety of substrates with different aspect ratios. An example of TiO2 posts is shown in the figure.