Sub-10 nm features obtained from directed self-assembly of semicrystalline polycarbosilane-based block copolymer thin films.
basic_science · Level V
Where this comes from
- Record sourced from PubMed, PMID 25382210.
- Also identified by DOI 10.1002/adma.201404077.
- No licence information is recorded for this record.
- Because redistribution is not established, this page shows the abstract only. Follow the links below for the full text.
Abstract
Highly-ordered arrays with sub-10 nm features are produced with topographical-directed self-assembly of low-molecular-weight poly(1,1-dimethyl silacyclobutane)-block-poly(methyl methacrylate). This system turns out to be of high interest for lithographic applications since the domain orientation is solely controlled through the polymer layer thickness, while the promotion of the microphase separation is obtained by a short thermal annealing process under mild conditions.