Microcontact-printing-assisted access of graphitic carbon nitride films with favorable textures toward photoelectrochemical application.
basic_science · Level V
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- Record sourced from PubMed, PMID 25492578.
- Also identified by DOI 10.1002/adma.201404543.
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Abstract
An "ink" (cyanamide) infiltrated anodic aluminum oxide (AAO) stamp is found capable of printing carbon nitride films featuring regular microstructures of the stamp onto the substrates via in situ "chemical vapor deposition". A photocurrent density of 30.2 μA cm(-2 --) at 1.23 VRHE is achieved for a film on a conductive substrate, which is so far the highest value for pure carbon nitride based photoelectrochemical devices.