One-Step Direct-Patterning Template Utilizing Self-Assembly of POSS-Containing Block Copolymers.
basic_science · Level V
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- Record sourced from PubMed, PMID 26042939.
- Also identified by DOI 10.1002/adma.200900518.
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Abstract
We report the self-assembly of organic-inorganic block copolymers (BCP) in thin-films by simple solvent annealing on unmodified substrates. The resulting vertically oriented lamellae and cylinders are converted to a hard silica mask by a single step highly selective oxygen plasma etching. The size of the resulting nanostructures in the case of cylinders is less than 10 nm.