Atomic Layer Deposition from Dissolved Precursors.
basic_science · Level V
Where this comes from
- Record sourced from PubMed, PMID 26418724.
- Also identified by DOI 10.1021/acs.nanolett.5b01424.
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Abstract
We establish a novel thin film deposition technique by transferring the principles of atomic layer deposition (ALD) known with gaseous precursors toward precursors dissolved in a liquid. An established ALD reaction behaves similarly when performed from solutions. "Solution ALD" (sALD) can coat deep pores in a conformal manner. sALD offers novel opportunities by overcoming the need for volatile and thermally robust precursors. We establish a MgO sALD procedure based on the hydrolysis of a Grignard reagent.