Room Temperature Oxide Deposition Approach to Fully Transparent, All-Oxide Thin-Film Transistors.
basic_science · Level V
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- Record sourced from PubMed, PMID 26455916.
- Also identified by DOI 10.1002/adma.201502159.
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Abstract
A room temperature cathodic arc deposition technique is used to produce high-mobility ZnO thin films for low voltage thin-film transistors (TFTs) and digital logic inverters. All-oxide, fully transparent devices are fabricated on alkali-free glass and flexible polyimide foil, exhibiting high performance. This provides a practical materials platform for the low-temperature fabrication of all-oxide TFTs on virtually any substrate.