High Pressure Chemical Vapor Deposition of Hydrogenated Amorphous Silicon Films and Solar Cells.
basic_science · Level V
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- Record sourced from PubMed, PMID 27174318.
- Also identified by DOI 10.1002/adma.201600415.
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Abstract
Thin films of hydrogenated amorphous silicon can be produced at MPa pressures from silane without the use of plasma at temperatures as low as 345 °C. High pressure chemical vapor deposition may open a new way to low cost deposition of amorphous silicon solar cells and other thin film structures over very large areas in very compact, simple reactors.