Metal-Organic Covalent Network Chemical Vapor Deposition for Gas Separation.
basic_science · Level V
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- Record sourced from PubMed, PMID 27296896.
- Also identified by DOI 10.1002/adma.201601010.
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Abstract
The chemical vapor deposition (CVD) polymerization of metalloporphyrin building units is demonstrated to provide an easily up-scalable one-step method toward the deposition of a new class of dense and defect-free metal-organic covalent network (MOCN) layers. The resulting hyper-thin and flexible MOCN layers exhibit outstanding gas-separation performances for multiple gas pairs.