Engineering Surfaces through Sequential Stop-Flow Photopatterning.
basic_science · Level V
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- Record sourced from PubMed, PMID 27615382.
- Also identified by DOI 10.1002/adma.201602900.
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Abstract
Solution-exchange lithography is a new modular approach to engineer surfaces via sequential photopatterning. An array of lenses reduces features on an inkjet-printed photomask and reproduces arbitrarily complex patterns onto surfaces. In situ exchange of solutions allows successive photochemical reactions without moving the substrate and affords access to hierarchically patterned substrates.