Chemical and Electronic Repair Mechanism of Defects in MoS<sub>2</sub> Monolayers.
basic_science · Level V
Where this comes from
- Record sourced from PubMed, PMID 28915006.
- Also identified by DOI 10.1021/acsnano.7b04162.
- No licence information is recorded for this record.
- Because redistribution is not established, this page shows the abstract only. Follow the links below for the full text.
Abstract
Using ab initio density functional theory calculations, we characterize changes in the electronic structure of MoS<sub>2</sub> monolayers introduced by missing or additional adsorbed sulfur atoms. We furthermore identify the chemical and electronic function of substances that have been reported to reduce the adverse effect of sulfur vacancies in quenching photoluminescence and reducing electronic conductance. We find that thiol-group-containing molecules adsorbed at vacancy sites may reinsert missing sulfur atoms. In the presence of additional adsorbed sulfur atoms, thiols may form disulfides on the MoS<sub>2</sub> surface to mitigate the adverse effect of defects.