Self-Templating Approaches to Hollow Nanostructures.
review · Level V
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- Record sourced from PubMed, PMID 30155924.
- Also identified by DOI 10.1002/adma.201802349.
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Abstract
This current research progress on the fabrication of hollow nanostructures by using self-templating methods is reviewed. After a brief introduction to the unique properties and applications of hollow nanostructures and the three general fabrication routes, the discussions are focused on the five main self-templating strategies, including galvanic replacement, the Kirkendall effect, Ostwald ripening, dissolution-regrowth, and the surface-protected hollowing process. Some newly developed synthetic routes are selected and discussed in detail. In conclusion, a summary and the perspectives on the directions that might lead the future development of this exciting field are presented.