Josephson junction with variable thickness of the dielectric layer.
basic_science · Level V
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- Record sourced from PubMed, PMID 32575328.
- Also identified by DOI 10.1103/PhysRevE.101.052215.
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Abstract
The dynamics of the fluxon in the Josephson junction is studied. The dielectric layer of the junction has a variable thickness. It is shown that the modified area of the junction acts on the fluxon as a potential barrier. The relation between the critical bias current and the thickness of the dielectric layer is analytically and numerically determined.