Area-Selective Atomic Layer Deposition of Metal Oxides on DNA Nanostructures and Its Applications.
basic_science · Level V
Where this comes from
- Record sourced from PubMed, PMID 33048526.
- Also identified by DOI 10.1021/acsnano.0c04493.
- No licence information is recorded for this record.
- Because redistribution is not established, this page shows the abstract only. Follow the links below for the full text.
Abstract
We demonstrate area-selective atomic layer deposition (ALD) of oxides on DNA nanostructures. Area-selective ALD of Al<sub>2</sub>O<sub>3</sub>, TiO<sub>2</sub>, and HfO<sub>2</sub> was successfully achieved on both 2D and 3D DNA nanostructures deposited on a polystyrene (PS) substrate. The resulting DNA-inorganic hybrid structure was used as a hard mask to achieve deep etching of a Si wafer for antireflection applications. ALD is a widely used process in coating and thin film deposition; our work points to a way to pattern oxide materials using DNA templates and to enhance the chemical/physical stability of DNA nanostructures for applications in surface engineering.
Medical subject headings
- Nanostructures