Self-Organized Growth of 111-Oriented (VNbTaMoW)N Nanorods on MgO(001).
basic_science · Level V
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- Also identified by DOI 10.1021/acs.nanolett.0c04061.
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Abstract
Refractory high-entropy alloy nitride, (VNbTaMoW)N, layers are grown on single-crystalline MgO(001) via ultrahigh vacuum direct current magnetron sputtering of a VNbTaMoW target in Kr/N<sub>2</sub> gas mixtures at 1073 K. X-ray diffraction, scanning and transmission electron microscopy, and energy dispersive X-ray spectroscopy characterizations revealed the formation of B1-structured, 111-textured (V<sub>0.21</sub>Nb<sub>0.18</sub>Ta<sub>0.19</sub>Mo<sub>0.21</sub>W<sub>0.21</sub>)N<sub>1.05</sub> with lattice parameter <i>a</i> = 0.4249 nm. The alloy nitride film exhibits dense columnar microstructure near the substrate-film interface with coherent 001 grain growth limited to a few tens of nanometers, followed by an outgrowth of quasi one-dimensional nanorods with 3-fold symmetric facets. We attribute the self-organized growth of rather unusual 111-textured nanorods on isostructural MgO(001) to kinetic limitations of the sputter-deposition process exacerbated by the sluggish diffusion of the multicomponent adspecies and the preferential growth of {111} crystals.