Rapid and Large-Scale Quality Assessment of Two-Dimensional MoS<sub>2</sub> Using Sulfur Particles with Optical Visualization.
basic_science · Level V
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- Record sourced from PubMed, PMID 33492150.
- Also identified by DOI 10.1021/acs.nanolett.0c03884.
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Abstract
The efficient nondestructive assessment of quality and homogeneity for two-dimensional (2D) MoS<sub>2</sub> is critically important to advance their practical applications. Here, we presented a rapid and large-area assessment method for visually evaluating the quality and uniformity of chemical vapor deposition (CVD)-grown MoS<sub>2</sub> monolayers simply with conventional optical microscopes. This was achieved through one-pot adsorbing abundant sulfur particles selectively onto as-grown poorer-quality MoS<sub>2</sub> monolayers in a CVD system without any additional treatment. We further revealed that this favorable adsorption of sulfur particles on MoS<sub>2</sub> originated from their intrinsic higher-density sulfur vacancies. Based on unadsorbed MoS<sub>2</sub> monolayers, superior performance field effect transistors with a mobility of ∼49 cm<sup>2</sup> V<sup>-1</sup> s<sup>-1</sup> were constructed. Importantly, the assessment approach was noninvasive due to the all-vapor-phase and moderate adsorption-desorption process. Our work offers a new route for the performance and yield optimization of devices by quality assessment of 2D semiconductors prior to device fabrication.