Nanoscale Bilayer Mechanical Lithography Using Water as Developer.
basic_science · Level V
Where this comes from
- Record sourced from PubMed, PMID 33886314.
- Also identified by DOI 10.1021/acs.nanolett.1c00251 and PMC identifier 8289280.
- Licence recorded as CC BY.
- The licence permits redistribution, so the abstract is shown in full and the full text is available from the publisher.
Abstract
Sustainability has become a critical concern in the semiconductor industry as hazardous wastes released during the manufacturing process of semiconductor devices have an adverse impact on human beings and the environment. The use of hazardous solvents in existing fabrication processes also restricts the use of polymer substrates because of their low chemical resistance to such solvents. Here, we demonstrate an environmentally friendly mechanical, bilayer lithography that uses just water for development and lift-off. We show that we are able to create arbitrary patterns achieving resolution down to 310 nm. We then demonstrate the use of this technique to create functional devices by fabricating a MoS<sub>2</sub> photodetector on a polyethylene terephthalate (PET) substrate with measured response times down to 42 ms.
Medical subject headings
- Printing
- Water