Room-Temperature, Low-Pressure Nanoimprinting Based on Cationic Photopolymerization of Novel Epoxysilicone Monomers.
basic_science · Level V
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- Record sourced from PubMed, PMID 34412429.
- Also identified by DOI 10.1002/adma.200401192.
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Abstract
A new UV-curable liquid resist based on cationic polymerization of silicone epoxies has been developed for UV-assisted nanoimprint lithography. Uniform films with thicknesses ranging from below 50 nm to over 1 μm can be easily spin-coated using a suitable undercoating layer on a substrate. Patterns with feature sizes ranging from tens of micrometers to 20 nm are imprinted at room temperature with a pressure of less than 0.1 MPa.