Even-Odd Layer-Dependent Anomalous Hall Effect in Topological Magnet MnBi<sub>2</sub>Te<sub>4</sub> Thin Films.
basic_science · Level V
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- Record sourced from PubMed, PMID 34468149.
- Also identified by DOI 10.1021/acs.nanolett.1c02493.
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Abstract
Recently, MnBi<sub>2</sub>Te<sub>4</sub> has been demonstrated to be an intrinsic magnetic topological insulator and the quantum anomalous Hall (QAH) effect was observed in exfoliated MnBi<sub>2</sub>Te<sub>4</sub> flakes. Here, we used molecular beam epitaxy (MBE) to grow MnBi<sub>2</sub>Te<sub>4</sub> films with thickness down to 1 septuple layer (SL) and performed thickness-dependent transport measurements. We observed a nonsquare hysteresis loop in the antiferromagnetic state for films with thickness greater than 2 SL. The hysteresis loop can be separated into two AH components. We demonstrated that one AH component with the larger coercive field is from the dominant MnBi<sub>2</sub>Te<sub>4</sub> phase, whereas the other AH component with the smaller coercive field is from the minor Mn-doped Bi<sub>2</sub>Te<sub>3</sub> phase. The extracted AH component of the MnBi<sub>2</sub>Te<sub>4</sub> phase shows a clear even-odd layer-dependent behavior. Our studies reveal insights on how to optimize the MBE growth conditions to improve the quality of MnBi<sub>2</sub>Te<sub>4</sub> films.