High-mobility hydrogenated polycrystalline In<sub>2</sub>O<sub>3</sub> (In<sub>2</sub>O<sub>3</sub>:H) thin-film transistors.
basic_science · Level V
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- Record sourced from PubMed, PMID 35228522.
- Also identified by DOI 10.1038/s41467-022-28480-9 and PMC identifier 8885685.
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Abstract
Oxide semiconductors have been extensively studied as active channel layers of thin-film transistors (TFTs) for electronic applications. However, the field-effect mobility (μFE) of oxide TFTs is not sufficiently high to compete with that of low-temperature-processed polycrystalline-Si TFTs (50-100 cm2V-1s-1). Here, we propose a simple process to obtain high-performance TFTs, namely hydrogenated polycrystalline In2O3 (In2O3:H) TFTs grown via the low-temperature solid-phase crystallization (SPC) process. In2O3:H TFTs fabricated at 300 °C exhibit superior switching properties with µFE = 139.2 cm2V-1s-1, a subthreshold swing of 0.19 Vdec-1, and a threshold voltage of 0.2 V. The hydrogen introduced during sputter deposition plays an important role in enlarging the grain size and decreasing the subgap defects in SPC-prepared In2O3:H. The proposed method does not require any additional expensive equipment and/or change in the conventional oxide TFT fabrication process. We believe these SPC-grown In2O3:H TFTs have a great potential for use in future transparent or flexible electronics applications.