High Performance Semiconducting Nanosheets <i>via</i> a Scalable Powder-Based Electrochemical Exfoliation Technique.

Wells, Rebekah A; Zhang, Miao; Chen, Tzu-Heng; Boureau, Victor; Caretti, Marina; Liu, Yongpeng; Yum, Jun-Ho; Johnson, Hannah et al. · ACS Nano · 2022

basic_science · Level V

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Abstract

The liquid-phase exfoliation of semiconducting transition metal dichalcogenide (TMD) powders into 2D nanosheets represents a promising route toward the scalable production of ultrathin high-performance optoelectronic devices. However, the harsh conditions required negatively affect the semiconducting properties, leading to poor device performance. Herein we demonstrate a gentle exfoliation method employing standard bulk MoS<sub>2</sub> powder (pressed into pellets) together with the electrochemical intercalation of a quaternary alkyl ammonium. The resulting nanosheets are produced in high yield (32%) and consist primarily of mono-, bi-, triatomic layers with large lateral dimensions (>1 μm), while retaining the semiconducting polymorph. Exceptional optoelectronic performance of nanosheet thin-films is observed, such as enhanced photoluminescence, charge carrier mobility (up to 0.2 cm<sup>2</sup> V<sup>-1</sup> s<sup>-1</sup> in a multisheet device), and photon-to-current efficiency while maintaining high transparency (>80%). Specifically, as a photoanode for iodide oxidation, an internal quantum efficiency up to 90% (at +0.3 V vs Pt) is achieved (compared to only 12% for MoS<sub>2</sub> nanosheets produced via ultrasonication). Further using a combination of fluorescence microscopy and high-resolution scanning transmission electron microscopy (STEM), we show that our gently exfoliated nanosheets possess a defect density (2.33 × 10<sup>13</sup> cm<sup>-2</sup>) comparable to monolayer MoS<sub>2</sub> prepared by vacuum-based techniques and at least three times less than ultrasonicated MoS<sub>2</sub> nanoflakes. Finally, we expand this method toward other TMDs (WS<sub>2</sub>, WSe<sub>2</sub>) to demonstrate its versatility toward high-performance and fully scalable van der Waals heterojunction devices.