Probing interlayer shear thermal deformation in atomically-thin van der Waals layered materials.
basic_science · Level V
Where this comes from
- Record sourced from PubMed, PMID 35810154.
- Also identified by DOI 10.1038/s41467-022-31682-w and PMC identifier 9271035.
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Abstract
Atomically-thin van der Waals layered materials, with both high in-plane stiffness and bending flexibility, offer a unique platform for thermomechanical engineering. However, the lack of effective characterization techniques hinders the development of this research topic. Here, we develop a direct experimental method and effective theoretical model to study the mechanical, thermal, and interlayer properties of van der Waals materials. This is accomplished by using a carefully designed WSe<sub>2</sub>-based heterostructure, where monolayer WSe<sub>2</sub> serves as an in-situ strain meter. Combining experimental results and theoretical modelling, we are able to resolve the shear deformation and interlayer shear thermal deformation of each individual layer quantitatively in van der Waals materials. Our approach also provides important interlayer coupling information as well as key thermal parameters. The model can be applied to van der Waals materials with different layer numbers and various boundary conditions for both thermally-induced and mechanically-induced deformations.