Improved Self-Heating in Short-Channel Monolayer WS<sub>2</sub> Transistors with High-Thermal Conductivity BeO Dielectrics.
basic_science · Level V
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- Record sourced from PubMed, PMID 36083833.
- Also identified by DOI 10.1021/acs.nanolett.2c02901.
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Abstract
Two-dimensional semiconducting transition metal dichalcogenides (TMDs) enable ultimate channel length scaling of transistor technology due to their atomic-thin body nature, which also brings the challenge of a pronounced self-heating effect inside the ultrathin channel. In particular, high current density under high electric field could lead to negative differential resistance behavior due to self-heating, not only limiting the current carrying capability of the TMDs transistors but also leading to severe reliability issues. Here, we report high-performance monolayer WS<sub>2</sub> transistors on a high-thermal-conductivity BeO dielectric with effective suppression of the self-heating effects, eliminating the negative differential resistance behavior at high field, as observed in the case of the HfO<sub>2</sub> dielectric. The monolayer CVD WS<sub>2</sub> device on BeO with a 50 nm channel length exhibits a record-high on-state current of 325 μA/μm, transconductance (<i>g</i><sub>m</sub>) of 150 μS/μm, and a on/off ratio of 1.8 × 10<sup>8</sup> at <i>V</i><sub>ds</sub> = 1 V, far exceeding previous results.