An Ultra-steep Slope Two-dimensional Strain Effect Transistor.
basic_science · Level V
Where this comes from
- Record sourced from PubMed, PMID 36417697.
- Also identified by DOI 10.1021/acs.nanolett.2c02194.
- No licence information is recorded for this record.
- Because redistribution is not established, this page shows the abstract only. Follow the links below for the full text.
Abstract
We introduce a high-performance and ultra-steep slope switch, referred to as strain effect transistor (SET), with a subthreshold swing < 0.68 mV/decade at room temperature for 7 orders of magnitude change in the source-to-drain current based on atomically thin 1T'-MoTe<sub>2</sub> as the channel material, piezoelectric lead zirconate titanate (PZT) as the gate dielectric, and nickel (Ni) as the source/drain contact metal. We exploit gate-voltage induced strain transduction in PZT leading to abrupt and reversible cracking of the metal contacts to achieve the abrupt switching. The SET also exhibits a low OFF-state current < 1 pA/μm, a high ON-state current > 1.8 mA/μm at a supply voltage of 1 V, a large current ON/OFF ratio > 1 × 10<sup>9</sup>, and a high transconductance of > 100 μS/μm. The switching delay for the SET was found to be < 5 μs, and no device failure was observed even after 1 million (1 × 10<sup>6</sup>) switching cycles.
Medical subject headings
- Nickel